Driven by the three strategic pillars of intelligent manufacturing, green processes, and localized substitution, HCVAC is accelerating the creation of a full-industry-chain vacuum coating solution, empowering China''s new energy sector to achieve high-quality breakthroughs in the global market.
We offer highly productive vacuum coating equipment and technologies along the hydrogen value chain, for example for coating bipolar plates for fuel cells and electrolyzers.
This article explains the principles of vacuum generation, reviews the main types of vacuum pumps used in PVD equipment, discusses system integration, and highlights future development trends.
Whether you are involved in solar energy, wind energy, energy storage or power equipment manufacturing, our solutions will meet your needs and help you successfully move into the future.
Based on specific examples of energy transition solutions, the related vacuum coating tasks, key parameters, coating equipment, and globally required coating capacities and scaling options will be discussed from the perspective of an equipment manufacturer.
To extend battery life, vacuum coating machines apply corrosion-resistant and wear-resistant layers to battery casings. Our PVD tile sputtering coating machine ensures uniform and durable coatings, improving performance in harsh environments.
We offer highly productive vacuum coating equipment and technologies along the hydrogen value chain, for example for coating bipolar plates for fuel cells and
Widely used in digital products, watches, hardware and other glass, metal, plastic, ceramic panels, parts surfaces, and AF, AS coatings on decorative and functional films to improve surface hardness, smoothness, wear resistance, Chemical resistance and easy cleaning.
The vacuum coating equipment apply new advanced ultra-hard Duralar nanocomposite coatings, replacing chrome and thermal spray coatings.
1) Vacuum chamber: evaporation chamber: Φ 400×H 450 mm, sputtering chamber: Φ 400×H 420 mm; 2) ★ Vacuum limit: evaporation chamber is better than 3.0 x 10-5 Pa, sputtering chamber is better than 5.0 x 10 -5 Pa；
